PECVD Nitride / PECVD Low Stress Nitride
Our PECVD nitride can be a great alternative to LPCVD nitride when it becomes important to stay within lower temperature ranges. Widely used in MEMS and semiconductor processing, PECVD nitride is a tensile stress film that can be used as a passivation layer or to help balance film stress within a stack. Using PECVD nitride in addition to PECVD oxide will help to reduce overall film stress, preventing delaminating and micro-cracking.
In addition to our standard PECVD nitride we also offer low stress PECVD nitride for applications where a thicker film is required.